# US 2023/0264232 A1 · Substrate treating apparatus comprising ultrasonic wave cleaning unit

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- Number: US 2023/0264232 A1
- Document ID: US20230264232A1
- Status: Published application
- Kind: A1
- Application number: 17/729,113
- Filed: 2022-04-26
- Published: 2023-08-24
- Earliest claimed: 2022-02-21
- Assignees: Deviceeng Co., Ltd.
- Applicants: Deviceeng Co., Ltd.
- Inventors: Taek Youb LEE
- Web page: https://patentgrep.com/patent/US20230264232A1

## CPC

- B08B 3/12: by sonic or ultrasonic vibrations
- B08B 13/00: Accessories or details of general applicability for machines or apparatus for cleaning
- H10P 72/0414: {using mainly spraying means, e.g. nozzles}
- H10P 72/7608: {characterised by a plurality of separate clamping members, e.g. clamping fingers}
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

The present invention relates to a substrate treatment apparatus including: a chuck base rotatably disposed around a rotating shaft; chuck pins disposed on top of the chuck base to fix a substrate thereto; and an ultrasonic cleaning unit disposed on top of the chuck base to perform ultrasonic cleaning for the underside of the substrate.

## Claims

### Claim 1

A substrate treatment apparatus comprising:
a chuck base rotatably disposed around a rotating shaft;
chuck pins disposed on top of the chuck base to fix a substrate thereto; and
an ultrasonic cleaning unit disposed on top of the chuck base to perform ultrasonic cleaning for the underside of the substrate.

### Claim 2 (depends on 1)

The substrate treatment apparatus according to claim 1, wherein the ultrasonic cleaning unit comprises:
an ultrasonic cleaning head extending in a radial direction of the substrate around the rotating shaft in a plan view and having an inner cleaning liquid flow path formed on top thereof toward the substrate;
an inner cleaning liquid supply tube whose first outlet is connected to the ultrasonic cleaning head to communicate with the inner cleaning liquid flow path; and
an outer cleaning liquid supply tube disposed on the outside of the ultrasonic cleaning head and having a second outlet formed toward the substrate.

### Claim 3 (depends on 2)

The substrate treatment apparatus according to claim 2, wherein a point of the outer cleaning liquid supply tube toward the substrate in the radial direction of the substrate is located at a longer distance than a point of the inner cleaning liquid flow path toward the substrate.

### Claim 4 (depends on 3)

The substrate treatment apparatus according to claim 3, wherein the chuck base has a fluid movement guide tube as a non-rotary part extending up and down along the center thereof to accommodate the inner cleaning liquid supply tube and the outer cleaning liquid supply tube extending up and down therealong.

### Claim 5 (depends on 4)

The substrate treatment apparatus according to claim 4, wherein the ultrasonic cleaning unit comprises an adapter disposed around the ultrasonic cleaning head near the inner cleaning liquid flow path in a plan view to allow the inner cleaning liquid supply tube to be drawn therefrom and connected to the ultrasonic cleaning head and to allow the outer cleaning liquid supply tube to be drawn therefrom and located toward the underside of the substrate.

### Claim 6 (depends on 2)

The substrate treatment apparatus according to claim 2, wherein an discharge port of the inner cleaning liquid flow path is formed at the transversal center of the ultrasonic cleaning head around the center of the substrate in a plan view, and the inner cleaning liquid flow path extends slantly toward the underside of the substrate in a radial direction thereof in a side view of the ultrasonic cleaning head.

### Claim 7 (depends on 2)

The substrate treatment apparatus according to claim 2, wherein the outer cleaning liquid supply tube is disposed slantly toward the ultrasonic cleaning head with respect to the radial direction around the rotary shaft in a plan view to thus have a rotational direction component of the chuck base.

### Claim 8 (depends on 2)

The substrate treatment apparatus according to claim 2, wherein the ultrasonic cleaning head becomes enlarged in width toward the radial direction of the substrate from the rotary shaft and then constant in width from the predetermined portion thereof to the end thereof in a plan view.

### Claim 9 (depends on 1)

The substrate treatment apparatus according to claim 1, wherein the ultrasonic cleaning unit comprises a pair of plate-shaped vibrators disposed inside the ultrasonic cleaning head in a longitudinal direction of the ultrasonic cleaning head, and in a cross-sectional view, the pair of vibrators is open inclined toward each other to allow the open portion to be located toward the substrate.

### Claim 10 (depends on 9)

The substrate treatment apparatus according to claim 9, wherein the vibrators become greater in width toward the peripheral edge of the substrate.

### Claim 11 (depends on 4)

The substrate treatment apparatus according to claim 4, wherein the ultrasonic cleaning unit comprises a cooling gas tube accommodatedly extending longitudinally in the fluid movement guide tube to communicate with the interior of the ultrasonic cleaning head.