Resist underlayer film-forming composition
AssigneeNissan Chemical Corporation
InventorsHikaru TOKUNAGA, Makoto NAKAJIMA, Hirokazu NISHIMAKI
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Abstract
A composition for forming a resist underlayer film containing a solvent and polymer comprising a unit structure (A) represented by formula (1) and/or formula (2). The composition is capable of forming a hydrophobic underlayer film that has a high contact angle with pure water and exhibits high adhesion to an upper layer film, thereby being not susceptible to separation therefrom, while meeting the requirement of good coatability, the composition being also capable of exhibiting other good characteristics such as sufficient resistance to a chemical agent that is used for resist underlayer films.
Claims13
A resist underlayer film-forming composition comprising a solvent and a polymer comprising a unit structure (A) represented by the following formula (1) and/or formula (2):
- wherein Ar1 and Ar2 each represent a benzene ring or naphthalene ring, Ar1 and Ar2 may be bonded via a single bond;
- Ar3 represents an aromatic compound having 6 to 60 carbon atoms and optionally containing a nitrogen atom;
- R1 and R2 are groups substituting hydrogen atoms on the rings of Ar1 and Ar2, respectively, and are selected from the group consisting of a halogen atom, a nitro group, an amino group, a cyano group, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, and the alkyl group, the alkenyl group, the alkynyl group and the aryl group may contain an ether bond, a ketone bond, or an ester bond;
- R3 and R8 are selected from the group consisting of an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, the alkyl group, the alkenyl group, the alkynyl group and the aryl group may contain an ether bond, a ketone bond, or an ester bond, and the aryl group may be substituted with an alkyl group having 1 to 10 carbon atoms substituted with a hydroxyl group;
- R4 and R6 are selected from the group consisting of a hydrogen atom, a trifluoromethyl group, an aryl group having 6 to 40 carbon atoms, and a heterocyclic group, the aryl group and the heterocyclic group may be substituted with a halogen atom, a nitro group, an amino group, a cyano group, a trifluoromethyl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, or an aryl group having 6 to 40 carbon atoms, and the alkyl group, the alkenyl group, the alkynyl group and the aryl group may contain an ether bond, a ketone bond, or an ester bond;
- R5 and R7 are selected from the group consisting of a hydrogen atom, a trifluoromethyl group, an aryl group having 6 to 40 carbon atoms, and a heterocyclic group, the aryl group and the heterocyclic group may be substituted with a halogen atom, a nitro group, an amino group, a cyano group, a trifluoromethyl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, or an aryl group having 6 to 40 carbon atoms, and the alkyl group, the alkenyl group, the alkynyl group and the aryl group may contain an ether bond, a ketone bond, or an ester bond;
- R4 and R5, and R6 and R7 may be combined with a carbon atom to which they are bonded to form a ring;
- n1 and n2 are each an integer of from 0 to 3;
- n3 is an integer of 1 or more but not more than a number of substituent with which Ar3 can be substituted;
- and
- n4 is 0 or 1, but when n4 is 0, R8 is bonded to a nitrogen atom contained in Ar3.
Dependencies are inferred from the claim text.