Projection system and projector
AssigneeSeiko Epson Corporation
InventorHirotaka Yanagisawa
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AssigneeSeiko Epson Corporation
InventorHirotaka Yanagisawa
Estimating the term…
A projection system includes a first and second optical system arranged from a reduction side toward an enlargement side. The second optical system includes an optical element having a concave reflection surface and a first lens having negative power, the optical element and first lens arranged from reduction side toward enlargement side. The projection system satisfies the following expressions: TR≤0.3 (1) 35≤(OAL/imy)×(LL/imy)×TR×(1/NA)≤60 (2) OAL represents an axial inter-surface spacing from an image formation device to the reflection surface, imy represents a first distance from an optical axis to the largest image height at the image formation device, LL represents the largest radius of the first lens, TR represents a throw ratio, and NA represents the numerical aperture of the image formation device.
A projection system for enlarging a projection image formed by an image formation device disposed in a reduction-side conjugate plane and projecting the enlarged image in an enlargement-side conjugate plane, the projection system comprising:
Dependencies are inferred from the claim text.