Plasma spraying material
AssigneeTomita Pharmaceutical Co., Ltd.
InventorsNaoyuki KITAMURA, Akihito BANDO, Yuta TSUMURA, Yohei KUSHIKI
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Abstract
The present invention addresses the problem of providing a plasma spraying material with which it is possible to form an HAp film that has high hardness and is not susceptible to abrasion, even under conditions involving plasma spraying with low flame energy. In the present invention, an HAp powder having an average particle diameter (D50) of 15-40 μm and a pore volume of 0.01-0.30 cc/g at a pore diameter of 2000 nm or less as measured through mercury intrusion makes it possible to form an HAp film that has high hardness, is not susceptible to abrasion, and can be subjected to plasma spraying, even under conditions involving plasma spraying with low flame energy.
Claims17
A plasma spraying material comprising a hydroxyapatite powder having an average particle size (D50) of 15 to 40 μm and, as measured by mercury porosimetry, a pore volume of 0.01 to 0.30 cc/g at a pore size of 2000 nm or less.
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Dependencies are inferred from the claim text.