Microfluidic chip and fabrication method

A fabrication method of a microfluidic chip, comprising:

• providing an array substrate;
• forming a hydrophilic layer on a side of the array substrate;
• forming a first photoresist pattern on a side of the hydrophilic layer away from the array substrate, wherein the first photoresist pattern corresponds to a region of a to-be-formed hydrophilic structure in the hydrophilic layer;
• etching the hydrophilic layer using the first photoresist pattern as a mask to form at least one hydrophilic structure;
• forming a hydrophobic layer on the side of the array substrate where the at least one hydrophilic structure is formed, wherein the hydrophobic layer includes at least one through-hole, along a direction perpendicular to a plane of the array substrate, a through-hole of the at least one through-hole penetrates through the hydrophobic layer, and a hydrophilic structure of the at least one hydrophilic structure and the first photoresist pattern are located in the through-hole;
• and
• removing the first photoresist pattern.