Equipment for treating substrate and treatment solution degassing method

An equipment for treating a substrate, the equipment comprising:

• a nozzle supplying a chemical solution to a substrate;
• and
• a chemical solution supply apparatus supplying the chemical solution to the nozzle,
• wherein the chemical solution supply apparatus includes
• a pump member including a pump case, and a bellows pump having one end airtightly fixed to the pump case, provides a storage space from the pump case, and contracted or expanded by a pressure control fluid,
• a dissolved gas extraction nozzle provided on a flow path through which the chemical solution is introduced into the pump member and spraying the chemical solution by a spray scheme, and
• a control unit configured to control an operation of the pump member, and
• the control unit includes
• a storing operation of storing the chemical solution in the pump member through the dissolved gas extraction nozzle,
• a bubble discharging operation of discharging the bubble separated from the chemical solution in the pump member after the storing operation, and
• an ejection operation of ejecting the chemical solution form which the bubble is removed from the pump member after the bubble discharging operation.