Polypeptide, photoresist composition including the same, and method of forming pattern using the same

A polypeptide comprising a region A, a region B, and a region C,

• wherein the region A has an alanine content of 20% or more and includes a first repeat unit having 4 to 10 consecutive amino acid residues,
• the region B has a tyrosine content of 10% or more and includes a second repeat unit having 4 to 10 consecutive amino acid residues, and
• the region C has a content, of 50% or more, of at least one of aspartic acid or glutamic acid, and includes a third repeat unit having 2 to 8 consecutive amino acid residues.