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US 2023/0178324 A1Published application
Three-dimensional beam forming x-ray source
AssigneeEmpyrean Medical Systems, Inc.
InventorsKalman Fishman, Brian P. Wilfley, Christopher W. Ellenor, Donald Olgado, Chwen-Yuan Ku, Tobias Funk, Petre Vatahov, Christopher R. Mitchell
Life of this patent
Estimating the term…
Abstract
X-ray target element is comprised of a planar wafer. The planar wafer element includes a target layer and a substrate layer. The target layer is comprised of an element having a relatively high atomic number and the substrate layer is comprised of diamond. The substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer.
Claims21
1-17. (canceled)
A method for generating X-ray photons, comprising:
- generating an electron beam;
- positioning a target wafer having a planar configuration in the path of the electron beam;
- generating X-ray radiation as a result of an interaction of the electron beam with the target wafer;
- causing the X-ray radiation to interact with a beam shield comprising both a first plurality of wall elements extending transversely from a first major planar face of the target wafer and a second plurality of wall elements extending transversely from a second major planar face of the target wafer opposed from the first major face;
- setting at least one of a beam shape and direction of the X-ray radiation by selectively controlling a location where the electron beam intersects the target wafer to determine an interaction of the X-ray radiation with both the first and second plurality of wall elements.
2 more elements
An X-ray source, comprising:
- an electron beam generator;
- a target wafer having a planar configuration including opposing first and second major planar faces, the target wafer responsive to an electron beam produced by the electron beam generator to produce X-ray radiation;
- a beam shield comprising a first plurality of wall elements extending transversely from the first major planar face and a second plurality of wall elements extending transversely from the second major planar face;
- wherein at least one of a beam shape and direction of the X-ray radiation is determined by an interaction of the electron beam with the target wafer and an interaction of the X-ray radiation and both the first and second plurality of wall elements.
1 more element
Dependencies are inferred from the claim text.