Multi-electron beam inspection device and multi-electron beam inspection method

A multi-electron beam inspection method comprising:

• applying multiple primary electron beams to a target object on which a pattern is formed;
• detecting, by using a multi-detector which includes a plurality of detection sensors each of which detects a secondary electron beam emitted due to that the target object is irradiated with a primary electron beam individually preset in multiple secondary electron beams emitted because the target object is irradiated with the multiple primary electron beams, the multiple secondary electron beams emitted due to that the target object is irradiated with the multiple primary electron beams, and acquiring secondary electron image data of each of the detection sensors, based on a detected value of the each of the detection sensors;
• generating reference image data of a position irradiated with each primary electron beam, based on design data serving as a basis of the pattern formed on the target object;
• synthesizing, for the each primary electron beam, the reference image data of the position irradiated with the primary electron beam concerned and portions of a plurality of reference image data of positions irradiated with other primary electron beams different from the primary electron beam concerned;
• and
• comparing synthetic reference image data having been synthesized, and secondary electron image data based on a value detected by the detection sensor which detects a secondary electron beam due to irradiation with the primary electron beam concerned.