Stabilization of carbon deposition precursors like c2h2

A composition comprising a mixture or solution of:

• acetylene;
• and
• a stabilizer comprising an amide having a vapor pressure of about 3 Torr or lower at 25° C., an amine, an imine, a nitrile having a vapor pressure of about 80 Torr or lower at 25° C., a nitrogen-containing saturated heterocyclic ring compound, a nitrogenwavs1-containing unsaturated heterocyclic ring compound, an unsaturated linear or branched hydrocarbon, an unsaturated ring hydrocarbon having a vapor pressure of about 5 Torr or lower at 25° C., a non-aromatic unsaturated ring hydrocarbon, an ether, a ketone, an aldehyde, an ester having a vapor pressure of about 90 Torr or lower at 25° C., an ionic liquid, a carbene, a silylene, a mixed electron donor compound comprising a pi bond and an atom having a lone electron pair, a phosphorus-containing compound in which the phosphorus atom has a lone electron pair, or a sulfur-containing compound in which the sulfur atom has a lone electron pair,
• wherein the ketone has a vapor pressure of about 30 Torr or lower at 25° C.;
• or wherein the ketone is selected from the group consisting of acetylacetone (acac), 2-butanone, 2-pentanone, 2-hexanone, 2-heptanone, 2-octanone, 2-nonanone, 2-decanone, 3-pentanone, 3-heptanone, 3-octanone, 3-nonanone, 3-decanone, and aromatic ketones comprising acetophenone, 3-hydroxyacetophenone, cyclohexanone, benzophenone, butyrophenone, acetylpyrazine, 2-acetyl pyridine, acrylophenone, capillin, dibenzoylmethane, indenone, 1-indanone, paroxypropione, phenylglyoxal, piceol, propriophenone, pyridoxal, 2,4,6-trihydroxyacetophenone, 2,4,5-trihydroxyacetophenone, or valerophenone.