Laminated film structure and method for manufacturing laminated film structure
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsKazuya SHIMADA, Masahito HAYAMIZU, Toshihiko SAKATA, Makoto CHAKUNO
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Abstract
A method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.
Claims16
A laminated film structure comprising:
- a to-be-treated object, the to-be-treated object being made of an insulator or an insulator having a conductive layer formed on a surface thereof in advance;
- and
- an oxide layer formed on a surface of the to-be-treated object;
- a catalyst layer provided on the oxide layer;
- and
- a metal layer provided on the catalyst layer,
- wherein a fluorine content of the oxide layer is 0.01% by mass or more and 1.0% by mass or less.
(canceled)
A method for manufacturing a laminated film structure comprising:
- forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, the to-be-treated object being made of an insulator or an insulator having a conductive layer formed on the surface thereof in advance;
- removing fluorine in the oxide layer;
- forming a catalyst layer by bringing the oxide layer into contact with a catalyst liquid;
- and
- forming a metal film on the catalyst layer by an electroless plating method.
(canceled)
Dependencies are inferred from the claim text.