Transparent electronic device and manufacturing method thereof

A manufacturing method of a transparent electronic device, comprising:

• forming a matrix layer on a first surface of an opaque metal layer;
• forming an organic film on a first surface of the opaque metal layer, thus forming a stack layer, wherein the organic film comprises a polymer containing carboxyl groups (—COOH);
• and
• disposing the stack layer in a processing environment in order to transform the opaque metal layer to an amorphous transparent oxycarbide layer, wherein the amorphous transparent oxycarbide layer is formed by a metal element, carbon element, oxygen element and an additional element, the metal element is selected from molybdenum (Mo), indium (In), tin (Sn), zinc (Zn), cadmium (Cd) and a combination thereof, and an atomic number percentage of the additional element is equal to or greater than 0% and is less than the least of an atomic number percentage of the metal element, an atomic number percentage of the oxygen element and an atomic number percentage of the carbon element.