Ultra-Thin Super Junction IGBT Device and Manufacturing Method Thereof
AssigneeShanghai Supersemiconductor Technology Co., Ltd.
InventorsYuzhou WU, Jiuying YU
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AssigneeShanghai Supersemiconductor Technology Co., Ltd.
InventorsYuzhou WU, Jiuying YU
Estimating the term…
The present invention discloses an ultra-thin super junction IGBT and a manufacturing method thereof, comprising: a metalized collector; a P-type collector region located on the metalized collector; an N-type FS layer located above the P-type collector region; an N-type FS isolating layer located above the N-type FS layer; a first N-type epitaxial layer located above the N-type FS isolating layer and a second N-type epitaxial layer located above the first N-type epitaxial layer; and a MOS structure located in the second N-type epitaxial layer. According to the present invention, thinning the chip thickness reduces forward conduction voltage drop and switching losses, while reducing thermal resistance and improving current conducting capability.
An ultra-thin super junction IGBT, characterized by comprising:
Dependencies are inferred from the claim text.