Wire grid polarizer and manufacturing method thereof

Abstract

The invention provides a wire grid polarizer and a manufacturing method thereof. The method comprising steps of providing a substrate, forming a conductive layer on the substrate, forming an inverted wire grid structure on the conductive layer by nano-imprint or lithography process, and depositing a metal on the inverted wire grid structure to form a wire grid structure by electroforming or electrodeless coating technology. The conductive layer is transparent to the light wave band of the application. Since the method is an additive process, nano-imprint electroplating, electroforming, or electrodeless coating technology can be used, and the steps are simplified compared with subtractive process. Thus, the invention reduces or eliminates the need for expensive lithography technology, and avoids the use of complicated dry etching process.

Dependencies are inferred from the claim text.