Correction amount specifying apparatus, method, program, and jig
AssigneeRigaku Corporation
InventorsTakuya KIKUCHI, Tetsuya OZAWA, Ryuji MATSUO
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Abstract
A correction amount specifying apparatus comprises circuitry for storing diffraction data including a combination of the diffraction angle of the irradiation X-rays with respect to the sample rotation angle and the sample surface height, the diffraction data being acquired by irradiating X-rays to a standard sample that is an aggregate of isotropic and stress free crystal particles, determining a first correspondence relationship based on the diffraction data, and specifying a correction amount of the sample surface height with respect to a desired sample rotation angle and a desired diffraction angle based on the first correspondence relationship.
Claims12
A correction amount specifying apparatus for specifying a correction amount for a deviation of an X-ray irradiation position caused by rotation of a sample with respect to a measurement system, comprising:
- processing circuitry configured to
- store diffraction data including a combination of a diffraction angle of the irradiated X-rays with respect to the sample rotation angle and the sample surface height, the diffraction data being acquired by irradiating X-rays to a standard sample that is an aggregate of isotropic and stress free crystal particles,
- determine a first correspondence relationship based on the diffraction data, and
- specify a correction amount of the sample surface height with respect to a desired sample rotation angle and a desired diffraction angle based on the first correspondence relationship.
A jig with a flat-plate shape for correcting a deviation of an X-ray irradiation position caused by rotation of a sample with respect to a measurement system, comprising:
- a first region and a second region provided adjacent each other on the receiving surface and respectively formed of materials whose intensity of the scattered X-rays are different,
- wherein the jig is mounted on the X-ray diffraction apparatus so as to be able to measure the scattered X-ray intensity by scanning the irradiation position to cross the boundary between the first region and the second region.
A correction amount specifying method for specifying a correction amount for a deviation of an X-ray irradiation position caused by rotation of a sample with respect to a measurement system, comprising the steps of:
- acquiring diffraction data including a combination of a diffraction angle of the irradiated X-rays with respect to the sample rotation angle and the sample surface height, the diffraction data being acquired by irradiating X-rays to a standard sample that is an aggregate of isotropic and stress free crystal particles,
- determining a first correspondence relationship based on the diffraction data, and
- specifying a correction amount of the sample surface height with respect to a desired sample rotation angle and a desired diffraction angle based on the first correspondence relationship.
A non-transitory computer readable recording medium having recorded thereon a correction amount specifying program for specifying a correction amount for a deviation of an X-ray irradiation position caused by rotation of a sample with respect to a measurement system, causing a computer to execute the processes of:
- determining a first correspondence relationship based on a diffraction data including a combination of a diffraction angle of the irradiated X-rays with respect to the sample rotation angle and the sample surface height, the diffraction data being acquired by irradiating X-rays to a standard sample that is an aggregate of isotropic and stress free crystal particles, and
- specifying a correction amount of the sample surface height with respect to a desired sample rotation angle and a desired diffraction angle based on the first correspondence relationship.
Dependencies are inferred from the claim text.