Gas treatment method and gas treatment device
AssigneeUshio Denki Kabushiki Kaisha
InventorKeisuke NAITO
Life of this patent
Estimating the term…
Abstract
Provided are a gas treatment method and a gas treatment device that enable efficient treatment of a VOC-containing gas to be treated by using ultraviolet light with a main emission wavelength of 180 nm or less. This method is a method for treating a gas to be treated containing a mixture of air and a substance that is a type of VOC and that is subjected to treatment by causing the gas to be treated to flow through a treatment space. A light source designed to emit ultraviolet light having a main emission wavelength of 160 nm to 180 nm is located in the treatment space, and the gas to be treated is passed through a gap with a separation distance of 10 mm or less from a light-emitting area of the light source at a flow velocity of 23 m/s or less.
Claims20
A gas treatment method for treating a gas to be treated containing a mixture of air and a substance that is a type of volatile organic compound (VOC) and that is subjected to treatment by causing the gas to be treated to flow through a treatment space,
- wherein a light source designed to emit ultraviolet light having a main emission wavelength of 160 nm to 180 nm is located in the treatment space, and the gas to be treated is passed through a gap with a separation distance of 10 mm or less from a light-emitting area of the light source at a flow velocity of 23 m/s or less.
A gas treatment device configured to treat a gas to be treated containing a mixture of air and a substance that is a type of volatile organic compound (VOC) and that is subjected to treatment by causing the gas to be treated to flow through a treatment space, the gas treatment device comprising:
- a gas inlet to introduce the gas to be treated into the treatment space;
- a gas outlet to exhaust the gas to be treated that is treated in the treatment space;
- and
- a light source located in the treatment space, the light source being configured to emit ultraviolet light having a main emission wavelength of from 160 nm to 180 nm,
- wherein the gas to be treated is passed through a gap with a separation distance of 10 mm or less from a light-emitting area of the light source at a flow velocity of 23 m/s or less.
-12. (canceled)
Dependencies are inferred from the claim text.