Pattern matching method
AssigneeTasmit, Inc.
InventorYuji MIURA
Life of this patent
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AssigneeTasmit, Inc.
InventorYuji MIURA
Estimating the term…
The method includes: determine a first integrated value by integrating measured values of widths of reference patterns (210A) belonging to a first group; determine a second integrated value by integrating measured values of widths of reference patterns (210B) belonging to a second group; performing second matching between patterns on an image of a second region and corresponding CAD patterns; determining a third integrated value by integrating measured values of widths of patterns (220A) belonging to a first group; determining a fourth integrated value by integrating measured values of widths of patterns (220B) belonging to a second group; and determining that the second matching has been performed correctly when the magnitude relationship between the third integrated value and the fourth integrated value coincides with the magnitude relationship between the first integrated value and the second integrated value.
A pattern matching method comprising:
A pattern matching method comprising:
Dependencies are inferred from the claim text.