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US 2023/0146321 A1Published application
Semiconductor device
AssigneeNuvoton Technology Corporation Japan
InventorsMitsuaki OYA, Masanori HIROKI, Keimei MASAMOTO, Shigeo HAYASHI
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Abstract
A semiconductor device includes: a first electrode provided on a semiconductor multilayer structure; a second electrode provided on a substrate; and a bonding metal layer which bonds the first electrode and the second electrode together. The bonding metal layer includes a gap inside.
Claims20
A semiconductor device, comprising:
- a first electrode provided on a semiconductor multilayer structure;
- a second electrode provided on a substrate;
- and
- a bonding metal layer that bonds the first electrode and the second electrode together, wherein
- the bonding metal layer includes a gap inside,
- the gap is embedded in the bonding metal layer without contacting the first electrode and the second electrode,
- the gap has a shape which includes an angular portion including a corner portion,
- the bonding metal layer is contact with the first electrode,
- the bonding metal layer includes a first layer having a first average crystal grain size and a second layer having a second average crystal grain size, the second layer being located opposite to the first layer,
- the first average crystal grain size is larger than the second average crystal grain size, and
- the gap exists in the second layer.
8 more elements
A semiconductor device, comprising:
- a first electrode provided on a semiconductor multilayer structure, the first electrode including a p-side electrode and an n-side electrode;
- a second electrode provided on a substrate;
- and
- a bonding metal layer that bonds the first electrode and the second electrode together, wherein
- the bonding metal layer includes a gap inside, and
- the gap exists only in the p-side electrode.
3 more elements
Dependencies are inferred from the claim text.