Modular deflection units in mirror symmetrical arrangement

A deflection module comprising:

• a first deflection unit comprising a first scanning device configured for scanning a first working beam over a first working field, wherein the first scanning device comprises:
• a first movable mirror for scanning the first working beam in a first direction by tilting around a first axis;
• and
• a second movable mirror for scanning the first working beam in a second direction by tilting around a second axis;
• a second deflection unit comprising a second scanning device configured for scanning a second working beam over a second working field;
• wherein the second scanning device comprises:
• a first movable mirror for scanning the second working beam in the first direction by tilting around a third axis;
• and
• a second movable mirror for scanning the second working beam in the second direction by tilting around a fourth axis;
• wherein the second movable mirror of the first scanning device and the second movable mirror of the second scanning device are arranged mirror-symmetrically with respect to each other and to a common plane of mirror symmetry , wherein the second axis is aligned with the fourth axis;
• and
• wherein the first working field and the second working field overlap in a common overlap area.

A modular deflection system comprising a first deflection module and a second deflection module,

• wherein each of the first deflection module and the second deflection module comprises:
• a first deflection unit comprising a first scanning device configured for scanning a first working beam over a first working field, wherein the first scanning device comprises:
• a first movable mirror for scanning the first working beam in a first direction by tilting around a first axis;
• and
• a second movable mirror for scanning the first working beam in a second direction by tilting around a second axis;
• a second deflection unit comprising a second scanning device configured for scanning a second working beam over a second working field;
• wherein the second scanning device comprises:
• a first movable mirror for scanning the second working beam in the first direction by tilting around a third axis;
• and
• a second movable mirror for scanning the second working beam in the second direction by tilting around a fourth axis;
• wherein the second movable mirror of the first scanning device and the second movable mirror of the second scanning device are arranged mirror-symmetrically with respect to each other and to a common plane of mirror symmetry, wherein the second axis is aligned with the fourth axis;
• and
• wherein the first working field and the second working field overlap in a common overlap area;
• wherein the first deflection module and the second deflection module are mutually attachable;
• wherein, when the first deflection module and the second deflection module are attached to each other, the common overlap area of the first deflection module and the common overlap area of the second deflection module overlap, thereby forming a common overlap field.

A deflection module comprising:

• a first deflection unit comprising a first scanning device configured for scanning a first working beam over a first working field, wherein the first scanning device comprises:
• a first movable mirror for scanning the first working beam in a first direction by tilting around a first axis;
• and
• a second movable mirror for scanning the first working beam in a second direction by tilting around a second axis;
• a second deflection unit comprising a second scanning device configured for scanning a second working beam over a second working field;
• wherein the second scanning device comprises:
• a first movable mirror for scanning the second working beam in the first direction by tilting around a third axis;
• and
• a second movable mirror for scanning the second working beam in the second direction by tilting around a fourth axis;
• wherein the second movable mirror of the first scanning device and the second movable mirror of the second scanning device are arranged mirror-symmetrically with respect to each other and to a common plane of mirror symmetry, wherein the second axis is aligned with the fourth axis;
• and
• wherein the first working field and the second working field overlap in a common overlap area;
• wherein the first scanning device further comprises a first galvanometer motor for tilting the second movable mirror of the first scanning device;
• wherein the second scanning device further comprises a second galvanometer motor for tilting the second movable mirror of the second scanning device;
• and
• wherein the first galvanometer motor and the second galvanometer motor are arranged on opposite sides of the respective second movable mirror with respect to the common plane of mirror symmetry, such that the first galvanometer motor and the second galvanometer motor are arranged mirror-symmetrically with respect to each other and to the common plane of mirror symmetry.