Optical device and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsYoungchul LEEM, Jeongyub LEE, Haesung KIM
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Abstract
An optical device forms a refractive index distribution for exhibiting a certain phase delay profile with respect to light in a visible light wavelength, and includes a nanopattern layer including a crystalline compound having a refractive index greater than 3 with respect to the light in the visible light wavelength band and a height equal to or less than 2 μm. The nanopattern layer may include the crystalline compound grown according to a selective epitaxial growth method, and accordingly, may have a height beneficial for a manufacturing process. Thus, the efficiency of the optical device may be improved.
Claims24
An optical device comprising:
- a substrate;
- and
- a nanopattern layer on the substrate and configured to form a refractive index distribution to exhibit a certain phase delay profile with respect to light in the visible spectrum,
- the nanopattern layer comprising a crystalline compound having a refractive index greater than 3 with reference to the light in the visible spectrum and having a height of 2 microns or less from a surface of the substrate.
An electronic device comprising:
- a lens assembly comprising an optical device, the optical device comprising;
- a substrate;
- and
- a nanopattern layer on the substrate and configured to form a refractive index distribution to exhibit a certain phase delay profile with respect to light in the visible spectrum,
- the nanopattern layer comprising a crystalline compound having a refractive index greater than 3 with reference to the light in the visible spectrum and having a height of 2 microns or less from a surface of the substrate;
- and
- an image sensor configured to convert an optical image or signal formed by the nanopattern layer into an electric signal.
A method of manufacturing an optical device, the method comprising:
- forming, on a crystalline substrate, a first pattern structure comprising a pattern having an aspect ratio greater than 1 and a first height;
- growing a first crystalline material layer up to or higher than the first height from a region without the first pattern structure, the first crystalline material layer grown on a surface region of the crystalline substrate;
- bonding a support substrate on the grown first crystalline material layer;
- and
- removing the crystalline substrate.
Dependencies are inferred from the claim text.