Novel filter material, face mask comprising the same and method of making the same
AssigneeKing's Flair Innovative Marketing Limited
InventorSiu Wah WONG
Life of this patent
Estimating the term…
Abstract
The present invention provides a filter material comprising an antistatic substrate having a predefined antistatic capacity, and one or more layers of nanofibers applied on the substrate. The one or more layers of nanofibers may be fabricated to have gradient structure in various parameters including thickness of nanofiber layer, nanofiber pore size, nanofiber diameter, nanofiber content and the like to suit different filtration applications. The present invention also provides a face mask comprising the filter material and a method for making the filter material.
Claims19
A filter material, comprising:
- an antistatic substrate having a predefined antistatic capacity, and one or more layers of nanofibers applied on the substrate.
A face mask comprising:
- an outer protective layer exposed to an external environment,
- an inner layer configured to fit for covering the mouth and nose of a wearer,
- at least one intermediate filter layer sandwiched between the outer layer and the inner layer, the at least intermediate filter layer comprising a filter material which has an antistatic substrate having a predefined antistatic capacity, and one or more layers of nanofibers applied on the substrate, and
- means for securing the face mask to the wearer's face.
A method of making a filter material comprising the steps of:
- a) electrospinning a first polymer solution onto an antistatic substrate from a first group of spinning electrodes to deposit first nanofibers on the substrate,
- b) electrospinning a second polymer solution onto the substrate from a second group of spinning electrodes to deposit second nanofibers on the first nanofibers, wherein the second polymer solution and the first polymer solutions are same or different, and
- c) drying the polymer-based material electrospun from the first polymer solution and the second polymer solution.
Dependencies are inferred from the claim text.