Methods and apparatus for correcting lithography systems
AssigneeApplied Materials, Inc.
InventorsQin ZHONG, Hwan Joo JEONG
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AssigneeApplied Materials, Inc.
InventorsQin ZHONG, Hwan Joo JEONG
Estimating the term…
Aspects of the present disclosure relate to methods and apparatus for correcting lithography systems. In one implementation, a method of operating a lithography system includes directing first light beams toward a reflective surface of a first substrate using an optical module. The method includes directing the first light beams collected through at least an objective lens toward a camera, and taking a plurality of first images of the first light beams. The method includes directing second light beams at an oblique angle toward a patterned surface of a second substrate using an illumination source disposed below the objective lens. The method includes directing the second light beams collected through at least an objective lens toward a camera, and taking a plurality of second images of the second light beams. The method includes determining a tip correction, a tilt correction, and an optimal vertical position for the optical module.
A method of operating a lithography system, comprising:
The method of claim 17, wherein the outer areas of the plurality of first images are corner areas and the outer areas of the plurality of second images are corner areas.
A non-transitory computer-readable medium comprising instructions that, when executed, cause a lithography system to:
The non-transitory computer-readable medium of claim 19, wherein the outer areas of the plurality of first images are corner areas and the outer areas of the plurality of second images are corner areas.
A non-transitory computer-readable medium comprising instructions that, when executed, cause a lithography system to:
The non-transitory computer-readable medium of claim 20, wherein the outer areas of the plurality of brightfield images are corner areas and the outer areas of the plurality of darkfield images are corner areas.
Dependencies are inferred from the claim text.