Apparatus and method of producing inorganic powder

An apparatus for producing inorganic powder, the apparatus comprising:

• a precursor supplier comprising a channel;
• and
• a reaction part where a gas-phase precursor supplied from the precursor supplier reacts with a reaction gas to obtain the inorganic powder,
• wherein the precursor supplier comprises a vaporization part where a condensed-phase precursor is vaporized to obtain the gas-phase precursor, and a partial precipitation part where the gas-phase precursor obtained in the vaporization part is partially precipitated to a condensed phase,
• wherein the channel of the precursor supplier is configured in such a manner that a fluid passes sequentially through the vaporization part and the partial precipitation part and then is discharged to the reaction part,
• wherein the gas-phase precursor remaining after being partially precipitated to the condensed phase in the partial precipitation part is injected into the reaction part,
• wherein an equilibrium vapor pressure of the precursor in the partial precipitation part is lower than a vapor pressure of the gas-phase precursor obtained in the vaporization part, and
• wherein an equilibrium vapor pressure of the precursor in the reaction part is equal to or higher than a vapor pressure of the gas-phase precursor partially precipitated to the condensed phase in the partial precipitation part.

A method for producing inorganic powder, the method comprising:

• forming a gas-phase precursor, by vaporizing a condensed-phase precursor in a vaporization part;
• partially precipitating the gas-phase precursor to a condensed phase in a partial precipitation part;
• and
• forming the inorganic powder, by having the gas-phase precursor remaining after being partially precipitated to the condensed phase react with a reaction gas in a reaction part,
• wherein a vapor pressure of the gas-phase precursor formed in the vaporization unit is higher than an equilibrium vapor pressure of the precursor in the partial precipitation part, such that the gas-phase precursor is partially precipitated in the partial precipitation part, and
• wherein, after the gas-phase precursor is partially precipitated in the partial precipitation part, a vapor pressure of the remaining gas-phase precursor is equal to or less than the equilibrium vapor pressure of the precursor in the reaction part.