Feed-forward and utilization of height information for metrology tools
AssigneeInternational Business Machines Corporation
InventorDaniel Schmidt
Life of this patent
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Abstract
Methods and systems for configuring a metrology tool are described. A processor can receive a height map of a sample from an apparatus configured to generate wafer height maps. The received height map can indicate height information of a plurality of features on a surface of the sample. The plurality of features can be located on a plurality of focal planes. The processor can generate settings for the metrology tool based on the height map of the sample.
Claims20
A method for configuring a metrology tool, the method comprising:
- receiving a height map of a sample from an apparatus configured to generate wafer height maps, the height map indicating height information of a plurality of features on a surface of the sample, wherein the plurality of features is located on a plurality of focal planes;
- and
- generating settings for the metrology tool based on the height map of the sample.
A system comprising:
- a metrology tool;
- a memory;
- an apparatus;
- a processor connected to the metrology tool, the memory, and the apparatus;
- the apparatus being configured to:
- generate a height map that indicates height information of a plurality of features on a surface of a sample, wherein the plurality of features is located on a plurality of focal planes;
- and
- send the generated height map to the processor;
- the processor being configured to:
- receive the height map from the apparatus;
- and
- generate settings for the metrology tool based on the height map.
A computer program product for configuring a metrology tool, the computer program product comprising a computer readable storage medium having program instructions embodied therewith, the program instructions executable by a processing element of a device to cause the device to:
- receive a height map of a sample from an apparatus configured to generate wafer height maps, the height map indicating height information of a plurality of features on a surface of the sample, wherein the plurality of features is located on a plurality of focal planes;
- and
- generate settings for the metrology tool based on the height map of the sample.
Dependencies are inferred from the claim text.