Method for producing quantum cascade laser element
AssigneeHamamatsu Photonics K.K.
InventorsAtsushi SUGIYAMA, Yuji KANEKO, Yasufumi TAKAGI
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AssigneeHamamatsu Photonics K.K.
InventorsAtsushi SUGIYAMA, Yuji KANEKO, Yasufumi TAKAGI
Estimating the term…
A method for manufacturing a quantum cascade laser element includes: a step of forming a semiconductor layer on a first major surface of a semiconductor wafer; a step of removing a part of the semiconductor layer by etching such that each of portions of the semiconductor layer includes a ridge portion; a step of forming an insulating layer such that at least a part of a surface of the ridge portion is exposed; a step of embedding the ridge portion in each of metal plating layers; a step of flattening a surface of the metal plating layers by polishing in a state where a protective member is disposed; a step of forming an electrode layer on a second major surface of the semiconductor wafer; and a step of cleaving the semiconductor wafer and the semiconductor layer in a state where the protective member is removed.
A method for manufacturing a quantum cascade laser element including a semiconductor substrate, a semiconductor laminate formed on the semiconductor substrate to include an active layer having a quantum cascade structure, a first electrode formed on a surface on an opposite side of the semiconductor laminate from the semiconductor substrate, and a second electrode formed on a surface on an opposite side of the semiconductor substrate from the semiconductor laminate, the method comprising:
Dependencies are inferred from the claim text.