Method of Manufacturing Semiconductor Device, Cleaning Method, and Non-transitory Computer-readable Recording Medium

A cleaning method, comprising:

• (a) lowering a temperature of a low temperature structure provided in a process vessel to a second temperature lower than a first temperature by supplying a coolant to a coolant flow path provided in the process vessel for a predetermined time, wherein a defect occurs when a cleaning gas is supplied to the low temperature structure at the first temperature;
• and
• (b) cleaning the low temperature structure by supplying the cleaning gas into the process vessel after (a),
• wherein the low temperature structure comprises at least one selected from the group consisting of:
• a material susceptible to corrosion by a process gas;
• a structure located in vicinity of a viewport where through an inside of the process vessel is visually recognizable from an outside of the process vessel;
• and
• a seal provided around the coolant flow path.

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform:

• (a) heating a substrate to a first temperature while supplying a process gas into a process vessel accommodating a substrate support;
• (b) lowering a temperature of a low temperature structure provided in the process vessel to a second temperature lower than the first temperature by supplying a coolant to a coolant flow path provided in the process vessel for a predetermined time after (a), wherein a defect occurs when a cleaning gas is supplied to the low temperature structure at the first temperature;
• and
• (c) cleaning the low temperature structure by supplying the cleaning gas into the process vessel after (b),
• wherein the low temperature structure comprises at least one selected from the group consisting of:
• a material provided with a coating capable of preventing corrosion due to the process gas;
• a structure located in vicinity of a viewport where through an inside of the process vessel is visually recognizable from an outside of the process vessel;
• and
• a seal provided around the coolant flow path.