US 2023/0142835 A1 · INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE

Abstract

A method for inspecting an extreme ultraviolet (EUV) light source includes: removing a collector mirror of the EUV light source from a collector chamber; installing an inspection apparatus within the collector chamber, the apparatus including a selectively extendable and retractable member and a camera at one end of the member; operating a first actuator to extend the member along a path through the interior chamber of the EUV light source, thereby moving the camera to a given position within the interior chamber of the EUV light source; operating a second actuator to pan the camera about an axis of rotation, thereby establishing a given camera orientation within the interior of the EUV light source; and, capturing an image of the interior chamber of the EUV light source with the camera while the camera is at the given position and orientation established by the operation of the first and second actuators.

Claims19

Dependent claims

A photolithography patterning method comprising:

inspecting an interior of a light source in an extreme ultraviolet (EUV) exposure system;
receiving a semiconductor substrate with a photoresist layer thereon in the EUV exposure system;
directing EUV radiation onto the photoresist layer to form a patterned layer;
and
etching the patterned layer to form a circuit layout;
wherein inspecting the interior of the light source comprises:
controlling an inspection device positioned within the light source, said inspection device including a camera having a field of view (FoV), said controlling comprising:
translating the camera to a first position within the interior of the light source such that the camera's FoV encompasses a first portion of the interior of the light source;
capturing, with the camera, a first set of image data representative of the camera's FoV while the camera is at the first position;
translating the camera to a second position within the interior of the light source such that the camera's FoV encompasses a second portion of the interior of the EUV light source, said second position being different from the first position;
and
capturing, with the camera, a second set of image data representative of the camera's FoV while the camera is at the second position.

9 more elements

Dependencies are inferred from the claim text.

Inspection system for extreme ultraviolet (euv) light source

Life of this patent

Inspection system for extreme ultraviolet (euv) light source

Life of this patent

Abstract

Claims19