Determination of measurement error in an etalon
AssigneeCymer, Inc.
InventorsRussell Allen Burdt, John Theodore Melchior, Kuo-Tai Teng
Life of this patent
Estimating the term…
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AssigneeCymer, Inc.
InventorsRussell Allen Burdt, John Theodore Melchior, Kuo-Tai Teng
Estimating the term…
Information relating to an etalon is accessed, the etalon being associated with a calibration parameter having a pre-set default value, the etalon being configured to produce an interference pattern including a plurality of fringes from a received light beam, and the information relating to the etalon including first spatial information related to a first fringe of the plurality of fringes and second spatial information related to a second fringe of the plurality of fringes. A first wavelength value of the received light beam is determined based on the spatial information related to the first fringe and an initial value of the calibration parameter. A second wavelength value of the received light beam is determined based on the spatial information related to the second fringe and the initial value of the calibration parameter. The first wavelength value and the second wavelength value are compared to determine a measurement error value.
An optical measurement apparatus for a light source, the optical measurement apparatus comprising:
A light source comprising:
A method comprising:
A method for calibrating an etalon, the method comprising:
Dependencies are inferred from the claim text.