Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method

A method of measuring pattern uniformity on the basis of a pupil image, the method comprising:

• generating and outputting light by using a light source;
• transferring, by using an optical system, the light from the light source to a measurement target disposed on a stage;
• detecting, by using a first detector, light reflected and diffracted by the measurement target or light diffracted by passing through the measurement target;
• and
• measuring pattern uniformity of an array area of the measurement target on the basis of the light detected by the first detector, wherein
• the detecting of the light comprises detecting a pupil image of a pupil plane by using the first detector, and
• the measuring of the pattern uniformity comprises measuring the pattern uniformity on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.

A method of manufacturing a mask, the method comprising:

• preparing a mask having an array area;
• generating and outputting light by using a light source;
• transferring, by using an optical system, the light from the light source to the mask disposed on a stage;
• detecting, by using a first detector, light reflected and diffracted by the mask or light diffracted by passing through the mask;
• and
• measuring pattern uniformity of the array area on the basis of the light detected by the first detector;
• wherein the detecting of the light comprises detecting a pupil image of a pupil plane by using the first detector, and
• wherein the measuring of the pattern uniformity is performed on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.