Plasma source and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorRyoji YAMAZAKI
Life of this patent
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Abstract
A plasma source comprises a metal member having an inlet and forming a wall that delimits an upstream flow of a processing gas supplied from the inlet, a ceramic member having an outlet and forming a wall that delimits a downstream flow of the processing gas discharged from the outlet, and a power supply device configured to supply a power for plasma generation into a chamber. The chamber includes the metal member and the ceramic member, and is configured to discharge an activated gas generated by producing plasma from the processing gas to the outside of the chamber through the outlet.
Claims12
A plasma source comprising:
- a metal member having an inlet and forming a wall that delimits an upstream flow of a processing gas supplied from the inlet;
- a ceramic member having an outlet and forming a wall that delimits a downstream flow of the processing gas discharged from the outlet;
- and
- a power supply device configured to supply a power for plasma generation into a chamber,
- wherein the chamber includes the metal member and the ceramic member, and is configured to discharge an activated gas generated by producing plasma from the processing gas to the outside of the chamber through the outlet.
A plasma processing apparatus comprising:
- a plasma source having a chamber and configured to discharge an activated gas generated by producing plasma from a processing gas in the chamber to the outside of the chamber through an outlet;
- and
- a reactor communicating with the chamber and configured to introduce the activated gas and process a substrate using the activated gas;
- wherein the plasma source includes:
- a metal member having an inlet and forming a wall that delimits an upstream flow of the processing gas supplied from the inlet;
- a ceramic member having the outlet and forming a wall that delimits a downstream flow of the processing gas discharged from the outlet;
- and
- a power supply device configured to supply a power for plasma generation into the chamber,
- wherein the chamber includes the metal member and the ceramic member.
Dependencies are inferred from the claim text.