Device and method for generating photomasks
AssigneesSTMicroelectronics (Crolles 2) SAS, STMicroelectronics S.r.l.
InventorsCharlotte BEYLIER, Mauricio GARCIA SUAREZ, Pascal URARD, Guillaume LANDIE
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Abstract
The present description concerns a method that includes the compression, by a processor, of an image comprising first patterns by transforming the image into a first representation formed of two-point elements. The method also includes the execution, by a neural network, of an inference operation on the first representation to generate a second representation formed of two-point elements. The method further includes the generation of a lithographic mask based on the decompression of the second representation.
Claims18
A method, comprising:
- compressing, by a processor, an image comprising first patterns, by transforming the image into a first representation formed of two-point elements;
- executing, by a neural network, an inference operation on the first representation to generate a second representation formed of two-point elements;
- and
- generating a lithographic mask based on decompression of the second representation.
A method, comprising:
- training a neural network to generate lithographic masks by:
- generating, at least partially by the neural network, an image representing a lithographic mask;
- estimating, by using a lithographic simulation tool, a pattern resulting from the use of the mask;
- comparing the resulting pattern and a reference pattern;
- and
- modifying one or a plurality of parameters of the neural network based on the comparison;
- and
- printing the image representing the lithographic mask on a support to produce the lithographic mask.
Dependencies are inferred from the claim text.