Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides
AssigneeHonda Motor Co., Ltd.
InventorsAvetik R. HARUTYUNYAN, Xufan LI
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Abstract
A method of making an atomic layer nanoribbon that includes forming a double atomic layer ribbon having a first monolayer and a second monolayer on a surface of the first monolayer, wherein the first monolayer and the second monolayer each contains a transition metal dichalcogenide material, oxidizing at least a portion of the first monolayer to provide an oxidized portion, and removing the oxidized portion to provide an atomic layer nanoribbon of the transition metal dichalcogenide material. Also provided are double atomic layer ribbons, double atomic layer nanoribbons, and single atomic layer nanoribbons prepared according to the method.
Claims21
1-20. (canceled)
A double atomic layer ribbon comprising a first monolayer and a second monolayer on a surface of the first monolayer,
- wherein the double atomic layer ribbon is formed by subjecting two or more precursor powders to a moisturized gas flow at a temperature sufficient to deposit the double atomic layer ribbon on a substrate via chemical vapor deposition,
- wherein the first monolayer has a first average width and the second monolayer has a second average width that is less than the first average width, and
- wherein the first monolayer and the second monolayer each comprises a transition metal dichalcogenide material.
A method of making a double atomic layer ribbon comprising:
- subjecting two or more precursor powders to a moisturized gas flow at a temperature sufficient to deposit the double atomic layer ribbon on a substrate via chemical vapor deposition,
- wherein the double atomic layer ribbon comprises a first monolayer and a second monolayer on a surface of the first monolayer,
- wherein the first monolayer has a first average width and the second monolayer has a second average width that is less than the first average width, and
- wherein the first monolayer and the second monolayer each comprises a transition metal dichalcogenide material.
An atomic layer nanoribbon formed by a process comprising:
- subjecting two or more precursor powders to a moisturized gas flow at a temperature sufficient to deposit a double atomic layer ribbon on a substrate via chemical vapor deposition, wherein the double atomic layer ribbon comprises a first monolayer and a second monolayer on a surface of the first monolayer, and wherein the first monolayer and the second monolayer each comprises a transition metal dichalcogenide material;
- oxidizing at least a portion of the first monolayer to provide an oxidized portion;
- and
- removing the oxidized portion to provide the atomic layer nanoribbon comprising the transition metal dichalcogenide material.
Dependencies are inferred from the claim text.