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US 2023/0119980 A1Published application
A method of manufacturing segregated layers above a substrate, and a method for manufacturing a device
AssigneeMerck Patent GmbH
InventorsDaniel HUDSON, Changsheng WANG, Kornel OCYTKO, Graham MORSE, Ben JEFFERY, Ralph R. DAMMEL, Takanori KUDO
Life of this patent
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Abstract
The present invention pertains to a method of manufacturing segregated layers above a substrate. The invention also pertains to methods of manufacturing a photoresist layer, photoresist patterns, a processed substrate and a device.
Claims21
-16. (canceled)
A method of manufacturing segregated layers above a substrate, comprising:
- (1) applying a composition above said substrate, wherein said composition comprises solvent (A), siloxane polymer (B) and high-carbon material (C);
- and
- (2) heating said substrate to form segregated layers of antireflective coating made from siloxane polymer (B) and spin-on-carbon coating made from high-carbon material (C), where placed said antireflective coating, spin-on-carbon coating and substrate in this order.
A composition self-segregating to antireflective coating and spin-on-carbon coating, comprising solvent (A), siloxane polymer (B) and high-carbon material (C).
Dependencies are inferred from the claim text.