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US 2023/0090510 A1Published application
Metal material and method for manufacturing metal material
AssigneeSumitomo Electric Industries, Ltd.
InventorsYusuke KUREISHI, Tomoharu TAKEYAMA, Akihisa HOSOE
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Abstract
A metal material comprising: a base material; an oxide layer disposed on a surface of the base material; and a metal layer disposed on a surface of the oxide layer, wherein the base material includes aluminum, the oxide layer includes aluminum, nickel, and oxygen, the metal layer includes nickel, and an average thickness of the oxide layer is no less than 50 nm and no more than 250 nm.
Claims17
A metal material comprising:
- a base material;
- an oxide layer disposed on a surface of the base material;
- and
- a metal layer disposed on a surface of the oxide layer, wherein
- the base material includes aluminum,
- the oxide layer includes aluminum, nickel, and oxygen,
- the metal layer includes nickel, and
- an average thickness of the oxide layer is no less than 50 nm and no more than 250 nm.
5 more elements
A method for manufacturing a metal material, comprising:
- providing a base material including aluminum;
- disposing a precursor layer including aluminum and nickel on a surface of the base material;
- disposing a metal layer including nickel on a surface of the precursor layer;
- and
- applying heat treatment to the base material on which the precursor layer and the metal layer are disposed, at a temperature of no less than 400° C. and no more than 600° C. to transform the precursor layer into an oxide layer including aluminum, nickel, and oxygen, wherein
- the disposing a precursor layer comprises:
- forming a thin film including aluminum oxide on the surface of the base material;
- and
- applying electroless plating to the base material on which the thin film is formed, using a nickel plating solution having a pH of more than 9 and less than 11 at 25° C.
6 more elements
Dependencies are inferred from the claim text.