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AssigneeRheinisch-Westfälische Technische Hochschule (RWTH) Aachen
InventorsPatrick BONGARTZ, Moritz MEYER, Matthias WESSLING
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The present invention relates to a gassing unit for bubble-free introduction of a process gas into a liquid located in a reactor, wherein the gassing unit comprises at least: a first gas receiving chamber and, spaced therefrom, a second gas receiving chamber for receiving a process gas, the two gas receiving chambers being connected to one another via at least two two-dimensional, gas-conducting diffusion membranes comprising hollow fibers spaced apart from one another and at least partially fixed to one another; a receptacle for a gas supply on at least one of the gas receiving chambers; a receptacle for a shaft on at least one of the gas receiving chambers; wherein the gassing unit for gassing the liquid in the reactor can be supplied with process gas via the gas supply receptacle, can be set into a rotational movement via the receptacle for the shaft and can form a convection flow within the reactor via the rotational movement of the gassing unit in the liquid. Furthermore, the present invention relates to a method for gassing a process liquid, a gas-liquid reactor comprising a gassing unit according to the invention, and the use of a gassing unit according to the invention for supplying biological cultures with process gases.
A gassing unit for bubble-free introduction of a process gas into a liquid located in a reactor, characterized in that the gassing unit at least comprises:
Gassing unit according to any one of the preceding claims, wherein the packing density of the diffusion membranes relative to the volume of the gassing unit, ex-pressed as the surface area of the hollow fibers divided by the volume of the gassing unit, is greater than or equal to 0.1 cm−1 and less than or equal to 7.5 cm−1.
Dependencies are inferred from the claim text.