# US 2023/0057512 A1 · Method for forming thin film using surface protection material > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2023/0057512 A1 - Document ID: US20230057512A1 - Status: Published application - Kind: A1 - Application number: 17/791,290 - Filed: 2020-12-30 - Published: 2023-02-23 - Earliest claimed: 2020-01-09 - Assignees: EGTM Co., Ltd. - Applicants: EGTM Co., Ltd. - Inventors: Geun Su LEE; Jae Min KIM; Woong Jin CHOI - Web page: https://patentgrep.com/patent/US20230057512A1 ## CPC - H10P 14/6339: {deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD} - C23C 16/403: {of aluminium, magnesium or beryllium} - C23C 16/45534: {Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers} - C23C 16/45553: {characterized by the use of precursors specially adapted for ALD} - H10P 14/668: {the materials being characterised by the deposition precursor materials} - H10P 14/69391: {the material containing aluminium, e.g. Al2O3} - H10P 14/69392: {the material containing hafnium, e.g. HfO2} - H10P 14/69393: {the material containing tantalum, e.g. Ta2O5} - H10P 14/69395: {the material containing zirconium, e.g. ZrO2} - H10D 1/68: Capacitors having no potential barriers - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES ## Abstract According to one embodiment of the present invention, a method of forming a thin film using a surface protection material, the method comprising: supplying a metal precursor to the inside of a chamber in which a substrate is placed so that the metal precursor is adsorbed to the substrate; purging the interior of the chamber; and supplying a reaction material to the inside of the chamber so that the reaction material reacts with the adsorbed metal precursor to form the thin film, wherein before forming the thin film, the method further comprises: supplying the surface protection material to the inside of the chamber so that the surface protection material is adsorbed to the substrate; and purging the interior of the chamber. ## Claims ### Claim 1 A method of forming a thin film using a surface protection material, the method comprising: supplying a metal precursor to the inside of a chamber in which a substrate is placed; purging the interior of the chamber; and supplying a reaction material to the inside of the chamber so that the reaction material reacts with the adsorbed metal precursor to form the thin film, wherein before forming the thin film, the method further comprises: supplying the surface protection material to the inside of the chamber; and purging the interior of the chamber. ### Claim 2 (depends on 1) The method of claim 1, wherein the surface protection material is represented by the following Chemical Formula 1: in , n is each independently an integer of 0 to 6, X is selected from O, S, R1 to R3 are independently an alkyl group having 1 to 6 carbon atoms, R4 is selected from hydrogen, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alkylthio group having 1 to 6 carbon atoms. ### Claim 3 (depends on 1) The method of claim 1, wherein the surface protection material is represented by the following Chemical Formula 2: in , n is each independently an integer of 0 to 6, R1 to R6 are each independently an alkyl group having 1 to 6 carbon atoms, R7 is selected from hydrogen, an alkyl group having 1 to 6 carbon atoms, and a dialkylamine having 1 to 6 carbon atoms. ### Claim 4 (depends on 1) The method of claim 1, wherein the reaction material is selected from 03, 02 and H2O. ### Claim 5 (depends on 1) The method of claim 1, wherein the metal precursor is a compound including at least one of a trivalent metal containing Al, a tetravalent metal containing Zr or Hf, and a pentavalent metal containing Nb or Ta. ### Claim 6 (depends on 1) The method of claim 1, wherein the metal precursor is represented by the following Chemical Formula 3: in , R1, R2 and R3 are different from each other and each independently selected from an alkyl group having 1 to 6 carbon atoms, a dialkylamine group having 1 to 6 carbon atoms, or a cycloamine group having 1 to 6 carbon atoms.