# US 2023/0055419 A1 · Display device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2023/0055419 A1 - Document ID: US20230055419A1 - Status: Published application - Kind: A1 - Application number: 17/888,604 - Filed: 2022-08-16 - Published: 2023-02-23 - Earliest claimed: 2021-08-17 - Assignees: Samsung Display Co., Ltd. - Applicants: Samsung Display Co., LTD. - Inventors: DAESOO KIM; DAEWON CHOI; YUNJONG YEO - Web page: https://patentgrep.com/patent/US20230055419A1 ## CPC - H10D 86/411: {characterised by materials, geometry or structure of the substrates} - H10K 59/131: Interconnections, e.g. wiring lines or terminals - G06F 1/1637: {Details related to the display arrangement, including those related to the mounting of the display in the housing} - G06F 1/1684: {Constructional details or arrangements related to integrated I/O peripherals not covered by groups G06F1/1635 - G06F1/1675} - G06F 1/1686: {the I/O peripheral being an integrated camera} - H10D 86/441: {Interconnections, e.g. scanning lines} - H10D 86/451: {characterised by the compositions or shapes of the interlayer dielectrics} - H10D 86/60: wherein the TFTs are in active matrices - H10K 50/858: comprising refractive means, e.g. lenses - H10K 59/121: characterised by the geometry or disposition of pixel elements - H10K 59/124: Insulating layers formed between TFT elements and OLED elements - H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES - H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES - G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N) ## Abstract A display device includes a display area, a pixel circuit area adjacent to the display area, and a functional module area between the display area and the pixel circuit area. An inorganic insulating layer is in the display area. A light phase compensation layer is in the functional module area and includes a same material as the inorganic insulating layer. A signal line is disposed in the functional module area, on the light phase compensation layer, and extends from the functional module area to the pixel circuit area. The organic insulating layer is on the inorganic insulating layer and extends from the display area to the functional module area to cover the signal line and the light phase compensation layer. ## Claims ### Claim 1 A display device comprising: a display area, a pixel circuit area adjacent to the display area, and a functional module area between the display area and the pixel circuit area; an inorganic insulating layer in the display area; a light phase compensation layer in the functional module area and including a same material as the inorganic insulating layer of the display area; a signal line corresponding to the light phase compensation layer, in the functional module area, and extending from the functional module area to the pixel circuit area; and an organic insulating layer facing the inorganic insulating layer, in the display area, and extending from the display area to the functional module area to face the light phase compensation layer with the signal line therebetween. ### Claim 2 (depends on 1) The display device of claim 1, further comprising: an etch stop layer facing the signal line with the light phase compensation layer therebetween, in the functional module area, and the etch stop layer in the functional module area including a transparent material. ### Claim 3 (depends on 2) The display device of claim 2, wherein each of the light phase compensation layer and the etch stop layer has an etch rate, and the etch rate of the etch stop layer is smaller than the etch rate of the light phase compensation layer. ### Claim 4 (depends on 2) The display device of claim 2, wherein the etch stop layer includes indium gallium zinc oxide or amorphous silicon. ### Claim 5 (depends on 4) The display device of claim 4, wherein the etch stop layer is in an entirety of the functional module area. ### Claim 6 (depends on 4) The display device of claim 4, wherein the etch stop layer in the functional module area defines an etch stop pattern spaced apart from the inorganic insulating layer of the display area. ### Claim 7 (depends on 1) The display device of claim 1, wherein the signal line includes a conductive metal oxide or a transparent conductive material. ### Claim 8 (depends on 7) The display device of claim 7, wherein the transparent conductive material includes indium tin oxide, indium zinc oxide or indium gallium oxide. ### Claim 9 (depends on 1) The display device of claim 1, wherein the inorganic insulating layer includes silicon oxide or silicon nitride. ### Claim 10 (depends on 1) The display device of claim 1, wherein within the functional module area, each of the organic insulating layer, the light phase compensation layer and the signal line has a refractive index, and the refractive index of the organic insulating layer is greater than the refractive index of the light phase compensation layer and smaller than the refractive index of the signal line. ### Claim 11 (depends on 10) The display device of claim 10, wherein the refractive index of the signal line is about 1.9 or more. ### Claim 12 (depends on 1) The display device of claim 1, further comprising within the functional module area: a substrate facing the signal line with the light phase compensation layer therebetween, and a functional module which provides a function of the display device, with light, the functional module facing the light phase compensation layer with the substrate therebetween. ### Claim 13 (depends on 12) The display device of claim 12, wherein the functional module includes a camera module, a face recognition sensor module, a pupil recognition sensor module, an acceleration sensor module, a proximity sensor module, an infrared sensor module or an illuminance sensor module. ### Claim 14 (depends on 1) The display device of claim 1, further comprising: a pixel circuit structure in the pixel circuit area and including a semiconductor element; and an emission structure in the functional module area and connected to the pixel circuit structure of the pixel circuit area. ### Claim 15 (depends on 14) The display device of claim 14, wherein the signal line electrically connects the pixel circuit structure of the pixel circuit area to the emission structure of the functional module area. ### Claim 16 A display device comprising: a display area, a pixel circuit area adjacent to the display area, and a functional module area between the display area and the pixel circuit area and including a functional module which provides a function of the display device, with light; an inorganic insulating layer in both the display area and the functional module area; a light phase compensation layer in the functional module area and including a same material as the inorganic insulating layer of the display area; a signal line corresponding to the light phase compensation layer, in the functional module area, and extending from the functional module area to the pixel circuit area; and an organic insulating layer facing the inorganic insulating layer, in the display area, and extending from the display area to the functional module area to face the inorganic insulating layer with each of the light phase compensation layer and the signal line therebetween. ### Claim 17 (depends on 16) The display device of claim 16, further comprising: an etch stop layer between the inorganic insulating layer and the light phase compensation layer, in the functional module area, and the etch stop layer in the functional module area including a transparent material. ### Claim 18 (depends on 17) The display device of claim 17, wherein each of the light phase compensation layer and the etch stop layer has an etch rate, and the etch rate of the etch stop layer is smaller than the etch rate of the light phase compensation layer. ### Claim 19 (depends on 17) The display device of claim 17, wherein the etch stop layer includes indium gallium zinc oxide or amorphous silicon. ### Claim 20 (depends on 16) The display device of claim 16, wherein the inorganic insulating layer includes silicon oxide or silicon nitride.