Plasma source and switch device
AssigneesKabushiki Kaisha Toshiba, Toshiba Energy Systems & Solutions Corporation
InventorsHisao MIYAZAKI, Hisashi YOSHIDA, Shigeya KIMURA, Toshiaki MATSUMOTO, Takaaki MURATA, Ryota SUGANUMA
Life of this patent
Estimating the term…
Abstract
According to one embodiment, a plasma source includes a container being configured to store a gas, a cathode member, and an anode member. The cathode member is provided in the container. The cathode member includes a plurality of first cathode layers. Each the cathode layers are arranged along a plurality of sides of a polygon. Each of the first cathode layers includes a first surface facing inside the polygon. The first surface is planar. The anode member is provided in the container.
Claims20
A plasma source, comprising:
- a container being configured to store a gas;
- a cathode member provided in the container, the cathode member including a plurality of first cathode layers, each the cathode layers being arranged along a plurality of sides of a polygon, each of the first cathode layers including a first surface facing inside the polygon, the first surface being planar;
- and
- an anode member provided in the container.
A plasma source, comprising:
- a container configured to store a gas;
- a cathode member provided in the container, the cathode member including a plurality of stacked bodies, each of the stacked bodies including a first cathode layer, a second cathode layer, and a first substrate provided between the first cathode layer and the second cathode layer, the stacked bodies being arranged along a plurality of sides of the polygon, a first surface of the first cathode layer and a second surface of the second cathode layer being planar;
- and
- an anode member provided in the container.
Dependencies are inferred from the claim text.