# US 2023/0053682 A1 · Method and apparatus to register template with spatial light modulator > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2023/0053682 A1 - Document ID: US20230053682A1 - Status: Published application - Kind: A1 - Application number: 17/407,786 - Filed: 2021-08-20 - Published: 2023-02-23 - Earliest claimed: 2021-08-20 - Assignees: Canon Kabushiki Kaisha - Applicants: Canon Kabushiki Kaisha - Inventors: James W. Irving; Mehul N. Patel - Web page: https://patentgrep.com/patent/US20230053682A1 ## CPC - G03F 9/7042: {Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting (non-exposure lithographic processes per se G03F7/0002)} - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - G03F 7/70116: {Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset. ## Claims ### Claim 1 An apparatus comprising: a processor; and a memory storing instructions that, when executed by the processor, cause the processor to perform operations comprising: irradiating a formable material in contact with a template to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM), inspecting the reference film to generate positional information of the elements of the SLM relative to an imprint field edge, determining positional offset of the elements of the SLM with respect to a holder of the template based on the positional information, and determining control parameters for the SLM based on the positional offset. ### Claim 2 (depends on 1) The apparatus according to claim 1, wherein the SLM is a Digital Micromirror/ Mirror Device (DMD). ### Claim 3 (depends on 2) The apparatus according to claim 2, wherein the predefined registration pattern is viewed in a field of view (FOV). ### Claim 4 (depends on 2) The apparatus according to claim 2, wherein the predefined registration pattern has a unique pattern in at least one dimension. ### Claim 5 (depends on 4) The apparatus according to claim 4, wherein the predefined registration pattern is viewed in a field of view (FOV). ### Claim 6 (depends on 5) The apparatus according to claim 5, wherein the predefined registration pattern has no repetitive section. ### Claim 7 (depends on 4) The apparatus according to claim 4, wherein the predefined registration pattern includes elements corresponding to the SLM on a column or row dimension being all in a first state. ### Claim 8 (depends on 1) The apparatus according to claim 1, wherein the operations, when in the image analysis mode, further comprising: identifying a predefined pattern of modified pixels in an image of the reference film; and identifying pixels in first and second states. ### Claim 9 (depends on 8) The apparatus according to claim 8, wherein the operations, when in the image analysis mode, further comprising: performing a non-linearity analysis. ### Claim 10 (depends on 2) The apparatus according to claim 2, wherein the predefined registration pattern has modified elements corresponding to the SLM in a concentric shape. ### Claim 11 A method comprising: irradiating a formable material under a template to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM), inspecting the reference film to generate positional information of the elements of the SLM relative to an imprint field edge, determining positional offset of the elements of the SLM with respect to a holder of the template based on the positional information, and determining control parameters for the SLM based on the positional offset. ### Claim 12 (depends on 11) The method according to claim 11, wherein the SLM is a Digital Micromirror/ Mirror Device (DMD). ### Claim 13 (depends on 12) The method according to claim 12, wherein the predefined registration pattern is viewed in a field of view (FOV). ### Claim 14 (depends on 12) The method according to claim 12, wherein the predefined registration pattern has a unique pattern in at least one dimension. ### Claim 15 (depends on 14) The method according to claim 14, wherein the predefined registration pattern is viewed in a field of view (FOV). ### Claim 16 (depends on 15) The method according to claim 15, wherein the predefined registration pattern has no repetitive section. ### Claim 17 (depends on 14) The method according to claim 14, wherein the predefined registration pattern includes elements corresponding to the SLM on a column or row dimension being all in a first state. ### Claim 18 (depends on 11) The method according to claim 11, wherein the operations, when in the image analysis mode, further comprising: identifying a predefined pattern of modified pixels in an image of the reference film; and identifying pixels in first and second states. ### Claim 19 (depends on 18) The apparatus according to claim 18, wherein the operations, when in the image analysis mode, further comprising: performing a non-linearity analysis. ### Claim 20 (depends on 12) The method according to claim 12, wherein the predefined registration pattern has modified elements corresponding to the SLM in a concentric shape. ### Claim 21 A system comprising: a radiation source; a spatial light modulator (SLM) having a plurality of elements to modulate light from the radiation source; an imprint assembly comprising: a template holder to hold a template. a substrate holder to hold substrate having a surface on which a formable material is deposited; a processor; and a memory storing instructions that, when executed by the processor, cause the processor to perform operations comprising: irradiating the formable material under the template to form a reference film using a predefined registration pattern associated with the SLM, inspecting the reference film to generate positional information of the elements of the SLM relative to an imprint field edge, determining positional offset of the elements of the SLM with respect to a holder of the template based on the positional information, and determining control parameters for the SLM based on the positional offset. ### Claim 22 (depends on 11) A method of manufacturing an article, the method comprising: forming a pattern on a substrate using a method according to claim 11; and processing the substrate on which the pattern has been formed to obtain the article.