# US 2023/0053438 A1 · Systems and methods to clean a continuous substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2023/0053438 A1 - Document ID: US20230053438A1 - Status: Published application - Kind: A1 - Application number: 17/983,093 - Filed: 2022-11-08 - Published: 2023-02-23 - Earliest claimed: 2019-07-31 - Assignees: Illinois Tool Works Inc. - Applicants: Illinois Tool Works Inc. - Inventors: Gregory T. Hall - Web page: https://patentgrep.com/patent/US20230053438A1 ## CPC - B08B 7/04: by a combination of operations - D06B 13/00: Treatment of textile materials with liquids, gases or vapours with aid of vibration - B08B 3/022: {Cleaning travelling work (B08B3/042 takes precedence)} - B08B 3/041: {Cleaning travelling work} - B08B 3/08: the liquid having chemical or dissolving effect - B08B 3/102: {with means for agitating the liquid (by agitating the container B08B3/042, B08B3/044, B08B3/045, B08B3/06)} - B08B 3/123: {Cleaning travelling work, e.g. webs, articles on a conveyor (conveyors B65G; handling webs B65H)} - B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL - D06B: TREATING TEXTILE MATERIALS USING LIQUIDS, GASES OR VAPOURS (mechanical treatment of natural fibrous or filamentary material to obtain fibres or filaments D01B) ## Abstract An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate. ## Claims ### Claim 1 A system to clean a continuous substrate, the system comprising: one or more high pressure nozzles configured to spray a high pressure, low flow spray of a first cleaning fluid at the continuous substrate to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and a dryer configured to dry the continuous substrate. ### Claim 2 (depends on 1) The system as defined in claim 1, further comprising a reflector plate positioned on an opposite side of the continuous substrate from the agitator and configured to reflect the energy from the agitator toward the continuous substrate. ### Claim 3 (depends on 1) The system as defined in claim 1, wherein the one or more high pressure nozzles comprise: one or more first high pressure nozzles configured to spray a first side of the continuous substrate with the high pressure, low flow spray; and one or more second high pressure nozzles configured to spray a second side of the continuous substrate with the high pressure, low flow spray. ### Claim 4 (depends on 1) The system as defined in claim 1, wherein the one or more high pressure nozzles are configured to apply the high pressure, low flow spray by displacing portions of the continuous substrate at multiple locations in the transverse direction of the continuous substrate, to create a wave shape for directing the sprayed first cleaning fluid away from the continuous substrate. ### Claim 5 (depends on 4) The system as defined in claim 4, wherein the one or more high pressure nozzles are configured to apply the high pressure, low flow spray by displacing the continuous substrate at different transverse locations at different locations along the length of the continuous substrate. ### Claim 6 (depends on 5) The system as defined in claim 5, further comprising a roller positioned between the different locations along the length of the continuous substrate to route the continuous substrate to the different locations. ### Claim 7 (depends on 1) The system as defined in claim 1, wherein the continuous substrate is between 6 inches and 12 inches in width. ### Claim 8 (depends on 1) The system as defined in claim 1, wherein the first cleaning fluid comprises deionized water. ### Claim 9 (depends on 1) The system as defined in claim 1, wherein the continuous substrate is not submerged during the applying of the high pressure, low flow spray. ### Claim 10 (depends on 1) The system as defined in claim 1, further comprising one or more low pressure nozzles configured to rinse the continuous substrate after applying the high pressure, low flow spray. ### Claim 11 (depends on 1) The system as defined in claim 1, further comprising an agitation bath and a plurality of rollers configured to transport the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having the agitation bath. ### Claim 12 (depends on 11) The system as defined in claim 11, wherein the agitation bath is configured to cycle the first cleaning fluid in the agitation bath via adding water to the agitation bath and permitting the first cleaning fluid to flow out of the agitation bath over a weir wall to a drain. ### Claim 13 (depends on 12) The system as defined in claim 12, wherein the agitation bath is configured to cycle the first cleaning fluid by conducting particulates toward the drain. ### Claim 14 (depends on 11) The system as defined in claim 11, further comprising one or more spray nozzles configured to spray the first cleaning fluid into the agitation bath to create surface turbulence in the agitation bath. ### Claim 15 (depends on 11) The system as defined in claim 11, further comprising a vacuum roller configured to vacuum moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume. ### Claim 16 (depends on 11) The system as defined in claim 11, further comprising one or more low pressure nozzles configured to rinse the continuous substrate following the agitation bath. ### Claim 17 (depends on 11) The system as defined in claim 11, further comprising transporting the continuous substrate into the agitation bath, adjacent the agitator, and out of the agitation bath. ### Claim 18 (depends on 1) The system as defined in claim 1, further comprising one or more low pressure nozzles configured to rinse the continuous substrate with a spray of a second cleaning fluid. ### Claim 19 (depends on 18) The system as defined in claim 18, wherein at least one of the first cleaning fluid or the second cleaning fluid comprises a surfactant. ### Claim 20 (depends on 18) The system as defined in claim 18, wherein the first cleaning fluid and the second cleaning fluid are the same.