Substrate preparation chamber with substrate positioning features
AssigneeKateeva, Inc.
InventorsKarl Andrew Nordhoff, Alexander Sou-Kang Ko, Christopher Buchner
Life of this patent
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Abstract
A substrate preparation chamber is described herein. The substrate preparation chamber comprises an enclosure, a rotatable substrate support disposed within the enclosure, and an atmosphere replacement system coupled to the enclosure. The substrate preparation chamber can be used with an inkjet printing system, where the substrate preparation chamber is coupled to a printing enclosure such that a door is operable to place the enclosure of the substrate preparation chamber in fluid communication with the printing enclosure.
Claims20
A substrate preparation chamber, comprising:
- an enclosure;
- a rotatable substrate support having two substrate locations disposed within the enclosure and a plurality of edge contact bodies;
- and
- an atmosphere replacement system coupled to the enclosure.
An inkjet printing system, comprising:
- an inkjet printer disposed within a printing enclosure;
- and
- a substrate preparation chamber coupled to the printing enclosure, the substrate preparation chamber comprising:
- a preparation enclosure with two or more doors;
- a rotatable substrate support disposed within the preparation enclosure;
- and
- an atmosphere replacement system coupled to the preparation enclosure, wherein at least one of the doors is operable to place the preparation enclosure and the printing enclosure in fluid communication.
A method of processing a substrate, comprising:
- disposing the substrate on a rotatable substrate support of a substrate preparation chamber;
- replacing the atmosphere within the substrate preparation chamber with an inert atmosphere;
- rotating the substrate to an output orientation within the substrate preparation chamber;
- and
- transferring the substrate to a printing system using a substrate handler.
Dependencies are inferred from the claim text.