Highly efficient far uv filtration system
AssigneeLumenlabs LLC
InventorsKevin C Baxter, Wei Cao, Min Shi
Life of this patent
Estimating the term…
Abstract
A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.
Claims49
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 234 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV C radiation in wavelengths longer than 240 nm.
The Far UV radiation system of claim 5 wherein said excimer bulb is an krypton-chloride excimer bulb.
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 231 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm.
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 232 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm.
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 233 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm.
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 235 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm.
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 236 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm.
A Far UV radiation system, comprising:
- a Far UV radiation source;
- and
- a high pass filter, said high pass filter having a cutoff wavelength of 237 nm when measured at an incidence angle of zero degrees, and said high pass filter adapted to substantially reduce UV C radiation emitted from said Far UV radiation source,
- wherein said Far UV radiation source and said high pass filter adapted such that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm.
Dependencies are inferred from the claim text.