Substrate treating apparatus

A substrate treating apparatus comprising:

• a treating block;
• and
• a controller;
• the treating block including a first cell and a second cell;
• each cell comprising:
• treating units configured to treat substrates;
• a single main transport mechanism disposed in a transport space and configured to transport the substrates to the treating units;
• wherein the treating units include solution treating units configured to treat the substrates with solutions and heat-treating units configured to heat-treat the substrates;
• the solution treating units are arranged on a first side of the transport space;
• the heat-treating units are arranged on a second side of the transport space;
• the transport space extends horizontally;
• the main transport mechanism and the treating units are in the same layout in plan view for the first cell and the second cell;
• the solution treating units are in the same layout in side view for the first cell and the second cell;
• the heat-treating units are in the same layout in side view for the first cell and the second cell;
• the controller includes:
• a storage medium configured to store a predetermined processing recipe;
• and
• a central processing unit configured to perform the processing recipe, and control the main transport mechanisms and the treating units such that treatments of the substrates carried out in the first cell are the same as treatments of the substrates carried out in the second cell.