Resist topcoat composition, and method of forming patterns using the composition

A resist topcoat composition, the composition comprising:

• an acrylic copolymer comprising a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2;
• an acid compound;
• and
• a solvent:
• wherein, in Chemical Formula M-1 and Chemical Formula M-2,
• R1 and R3 are each independently hydrogen or a substituted or unsubstituted C1 to C10 alkyl group,
• R2 is hydrogen, a fluorine, a hydroxy group, or a substituted or unsubstituted C1 to C20 alkyl group,
• R4 is a substituted or unsubstituted C1 to C20 alkyl group, or *—O-L3-O—R5, L1 to L3 are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group, L4 is a substituted or unsubstituted C5 to C20 alkylene group,
• R5 is a substituted or unsubstituted C1 to C10 alkyl group,
• X1 is a single bond, —O—, —S—, —S(O)—, —S(O)2—, —C(O)—, —(CO)O—, —O(CO), —O(CO)O— or —NR′— (wherein R′ is hydrogen, deuterium, or a C1 to C10 alkyl group), R2, L1, and L2 together comprise a fluorine and a hydroxy group, and
• * is a linking point.