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US 2023/0019656 A1Published application
Sputtering Target
AssigneeJX Nippon Mining & Metals Corporation
InventorsMasayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
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Abstract
A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
Claims8
A sputtering target containing Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, wherein the sputtering target contains Ti, Nb, and O, and wherein the sputtering target has a phase including all of Ti, Nb, and O.
Dependencies are inferred from the claim text.