Silica glass, high frequency device using silica glass, and silica glass production method
AssigneeAGC Inc.
InventorKazuya SASAKI
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Abstract
The present invention relates to a silica glass including bublles in the number of 1×107/cm3 to 1×1015/cm3 and having a density of 0.5 g/cm3 to 1.95 g/cm3. The present invention also relates to a method for producing a silica glass, including: a step of depositing SiO2 fine particles generated by flame hydrolysis of a silicon compound, to obtain a silica glass porous body; a step of heating and sintering the silica glass porous body in an inert gas atmosphere, to obtain a silica glass dense body; and a step of performing a foaming treatment to heat the silica glass dense body under a reduced pressure condition.
Claims14
A silica glass,
- comprising bublles in the number of 1×107/cm3 to 1×1015/cm3 and
- having a density of 0.5 g/cm3 to 1.95 g/cm3.
A method for producing a silica glass, comprising:
- a step of depositing SiO2 fine particles generated by flame hydrolysis of a silicon compound, to obtain a silica glass porous body;
- a step of heating and sintering the silica glass porous body in an inert gas atmosphere, to obtain a silica glass dense body;
- and
- a step of performing a foaming treatment to heat the silica glass dense body under a reduced pressure condition.
Dependencies are inferred from the claim text.