Film, laminate, semiconductor wafer with film layer, substrate for mounting semiconductor with film layer, and semiconductor device

A film comprising:

• a compound (A) comprising at least one selected from the group consisting of a maleimide compound and a citraconimide compound;
• an organic peroxide (B) comprising at least one selected from the group consisting of organic peroxides represented by the following formula (1) and the following formula (2);
• and
• an imidazole compound (C) represented by the following formula (5):
• wherein each R1 independently represents a hydrogen atom, a methyl group, or an ethyl group;
• wherein each R2 independently represents a hydrogen atom, a methyl group, or an ethyl group, and X1 represents a group represented by the following formula (3) or (4);
• wherein R3 represents a hydrogen atom, a methyl group, or an ethyl group, R4 represents an alkylene group having 1 or more and 3 or less carbon atoms, and R5 represents a hydrogen atom or an alkyl group having 1 or more and 6 or less carbon atoms;
• wherein each R6 independently represents a hydrogen atom, a methyl group, or an ethyl group, and X2 represents a group represented by the following formulae (a) to (c);
• wherein n1 represents an integer of 1 or more and 5 or less;
• and
• wherein R7 represents a methyl group or an ethyl group, R8 represents a hydrogen atom, an alkyl group having 1 or more and 5 or less carbon atoms, an aryl group, or an aralkyl group, and R9 represents a hydrogen atom, an alkyl group having 1 or more and 5 or less carbon atoms, an aryl group, or an aralkyl group.