Method for controlling dynamically controllable ultrawide-amplitude and high-response ion source

A method for controlling a dynamically controllable ultrawide-amplitude and high-response ion source, comprising:

• 1) establishing a removal function database;
• 2) acquiring an initial surface error of an optical component, matching a removal function according to the initial surface error and the removal function database, and resolving dwell time of ion beam machining based on the matched removal function;
• 3) selecting an optimal velocity V of a movable shaft of a machine tool according to the resolved result of the dwell time;
• 4) dynamically resolving process parameters of an ion source according to the initial surface error of the optical component and the velocity V of the movable shaft, and generating a corresponding numerical control (NC) program to machine the optical component;
• and
• 5) determining whether a surface error of the machined optical component meets a requirement, ending and exiting the program if a result of determination is positive, or otherwise, repeating step 2).