US 2022/0367138 A1Published application

Ion source with multiple bias electrodes

AssigneeAxcelis Technologies, Inc.

InventorsWilhelm Platow, Paul Silverstein, Neil Bassom, Marvin Farley, David Sporleder

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Abstract

An ion source has an arc chamber having first and second ends and an aperture plate to enclose a chamber volume. An extraction aperture is disposed between the first and second ends. A cathode is near the first end of the arc chamber, and a repeller is near the second end. A generally U-shaped first bias electrode is on a first side of the extraction aperture within the chamber volume. A generally U-shaped second bias electrode is on a second side of the extraction aperture within the chamber volume, where the first and second bias electrodes are separated by a first distance proximate to the extraction aperture and a second distance distal from the extraction aperture. An electrode power supply provides a first and second positive voltage to the first and second bias electrodes, where the first and second positive voltages differ by a predetermined bias differential.

Claims20

Dependent claims

An ion source, comprising:

an arc chamber having a first end and a second end opposite the first end;
an aperture plate operably coupled to the arc chamber, therein generally enclosing a chamber volume, wherein the aperture plate comprises an extraction aperture disposed between the first and second ends of the arc chamber;
a cathode disposed within the chamber volume proximate to the first end of the arc chamber;
a repeller disposed within the chamber volume proximate to the second end of the arc chamber;
a first bias electrode disposed within the chamber volume on a first side of the extraction aperture, wherein the first bias electrode is generally U-shaped when viewed from the first end;
a second bias electrode disposed within the chamber volume on a second side of the extraction aperture, wherein the second bias electrode is generally U-shaped when viewed from the first end, wherein the first and second bias electrodes are separated by a first distance in a first region proximate to the extraction aperture, and wherein the first and second bias electrodes are separated by a second distance in a second region distal from the extraction aperture;
and
an electrode power supply electrically coupled to the first bias electrode and second bias electrode and configured to provide a first positive voltage to the first bias electrode and a second positive voltage to the second bias electrode, wherein the second positive voltage differs from the first positive voltage by a predetermined bias differential.

5 more elements

An ion source comprising:

an arc chamber having a first arc chamber wall extending from a first end of the arc chamber to a second end of the arc chamber, wherein the first wall has an extraction aperture defined therein that is positioned between the first and second ends of the arc chamber;
an indirectly heated cathode disposed proximate to the first end of the arc chamber, wherein the indirectly heated cathode comprises heater filament and cap, and wherein the heater filament is configured to receive electrical power to heat the cap;
a first bias electrode disposed between the first and second ends of the arc chamber on a first side of the extraction aperture, wherein the first bias electrode is generally U-shaped when viewed from the first end;
and
a second bias electrode disposed between the first and second ends of the arc chamber on a second side of the extraction aperture, wherein the second bias electrode is generally U-shaped when viewed from the first end;
and
a resistive element, associated with one or more of the first bias electrode and the second bias electrode, wherein a resistance of the resistive element defines a predetermined bias differential between the first bias electrode and second bias electrode.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 17/318,325Filed 12 May 2021
Published: 17 Nov 2022
Term ends: Not estimatedThe source records don’t support an estimate.

Classification6 codes

H01J 27/024
Details: extraction optics, e.g. grids
H01J 37/3171
For changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation: for ion implantation
H01J 27/08
Ion sources; Ion guns: using arc discharge
H01J 37/08
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical…:…