Resist composition and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Masaki Ohashi
Life of this patent
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Abstract
A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
Claims16
A resist composition comprising a sulfonium salt of a carboxylic acid having a benzene ring substituted with at least one nitro group, wherein the carboxylic acid is free of iodine and bromine, and when the benzene ring is substituted with fluorine, the number of fluorine atoms is up to 3.
Dependencies are inferred from the claim text.